Nice collab work highlighting tandem ellipsometry and spectrometry to study atomic scale processes. Thanks to #NSFPREM award for support.
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma pubs.aip.org/avs/jva/arti...
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma pubs.aip.org/avs/jva/arti...
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma
The etching of ZnO thin films using acetylacetone (Hacac) doses with long exposure times, followed by purging and subsequent exposure to O2 plasma, is studied i
pubs.aip.org
May 24, 2025 at 5:17 PM
Nice collab work highlighting tandem ellipsometry and spectrometry to study atomic scale processes. Thanks to #NSFPREM award for support.
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma pubs.aip.org/avs/jva/arti...
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma pubs.aip.org/avs/jva/arti...