arXiv abstract link

arXiv abstract link

Ultralow-noise lasers are essential for precision applications that rely on narrow atomic transitions, such as optical metrology, atomic clocks and quantum sensing1,2,3. They are also crucial for optical sensing and signal generation technologies that require long coherence times, including LiDAR, fibre-optic sensing and coherent data communication protocols4,5,6. When scaling such high-coherence technologies from the laboratory to field applications, semiconductor lasers are the most compelling option: they can be fabricated at scale, are directly electrically pumped and can be readily integrated into complex photonic systems7. However, semiconductor lasers have linewidths ranging in the tens of kilohertz to megahertz, which are orders of magnitude larger than state-of-the-art bench-top fibre lasers commonly used for the aforementioned applications. An effective way to reduce the laser linewidth is self-injection locking (SIL) in which optical feedback from a high-quality-factor (Q) cavity suppresses the intrinsic noise of the laser, enabling frequency noise reductions of more than six orders of magnitude compared with the free-running state8,9. The concept was first implemented in solid-state lasers10 and later applied to stabilize semiconductor lasers11,12,13, demonstrating linewidth narrowing by up to six orders of magnitude if a high-Q microresonator is involved14. Major advances were made by leveraging high-Q and high-finesse whispering-gallery-mode microresonators...

China is trying to broaden the definition of the extreme ultraviolet (EUV) race. Rather than focusing only on building a domestic equivalent to ASML's lithography platform, Chinese researchers are exploring alternative EUV light sources that could improve energy efficiency, support semiconductor metrology and eventually provide new options for advanced lithography.

arXiv abstract link

arXiv abstract link

arXiv abstract link

Japan Metrology Market is predicted to grow at 5.08% CAGR, reaching USD 0.68 Million by 2035, Japan Metrology Industry Analysis by Product Type and End User

India Metrology Market is predicted to grow at 5.08% CAGR, reaching USD 0.85 Million by 2035, India Metrology Industry Analysis by Product Type and End User

China Metrology Market is predicted to grow at 9.29% CAGR, reaching USD 4.25 Billion by 2035, China Metrology Industry Analysis by Product Type and End User

Optical Metrology Market is expected to USD 6.95 Billion at 5.48% CAGR by 2035, Global Optical Metrology Industry Analysis by Technology, Application, End Use Industry, Measurement Type, Region