Micro/nanofabrication techniques have revolutionized modern photonics and electronics. However, conventional methods remain incompatible with living organisms due to inherent constraints including non...

Micro/nanofabrication techniques have revolutionized modern photonics and electronics. However, conventional methods remain incompatible with living organisms due to inherent constraints including non...

Targeting of exocytosis enables cellular morphogenesis, motility and polarized transport, yet relati

Metal-halide perovskites (MHPs) have exciting optoelectronic properties and are under investigation for various applications, such as photovoltaics, light-emitting diodes, and lasers. An essential ste...

Metal-halide perovskites (MHPs) have exciting optoelectronic properties and are under investigation for various applications, such as photovoltaics, light-emitting diodes, and lasers. An essential ste...

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Wafer-scale fabrication of high-performance micro-electro-mechanical systems (MEMS) bio/chemical sensing chips remains constrained by the absence of reliable methods for integrating high-performance nanomaterials into suspended MEMS architectures. Here, a wafer-level manufacturing strategy is presented that redefines the MEMS process flow as “film first, cantilever later.” Through kinetically controlled self-assembly, wet-chemically synthesized Pd/SnO2 nanospheres are transferred as dense, uniform monolithic films onto 8-inch wafers. An HfO2 interface passivation patterning technology resolves long-standing incompatibility between functional sensing films and silicon substrates, enabling precise patterning and reliable integration on suspended MEMS cantilevers. The resulting Pd/SnO2 MEMS H2 chips are fabricated onto an 8-inch wafer, demonstrating high sensitivity and consistency. This approach overcomes long-standing wafer-level manufacturing challenges in the formation and patterning of high-performance nanomaterials film, establishing a fully integrated wafer-level process that fundamentally redefines the manufacturing route for tetramethylammonium hydroxide-resistant nanomaterial-based MEMS sensing chips.

Three-dimensional (3D) stacking of nano-devices is an effective method for increasing areal density, especially as downscaling of lateral device dimensions beco

A light-controlled nano-tool enables instant and reversible manipulations of endogenous proteins in Drosophila.

Organic optoelectronic devices demonstrate immense potential in flexible displays, wearable electronics, and artificial skin, needing precise light-field and morphology management strategies to further improve their opto-electric performance. Nanoimprint lithography (NIL) has emerged as a high-resolution, high-efficiency, and low-cost patterning technique that mechanically transferring micro/nanoscale patterns from a template to a substrate to significantly enhance the optoelectronic performance through the precise creation of advanced light-management structures, combined with additional solid-state stacking morphology. This review systematically summarizes recent advances in NIL technology for organic optoelectronics. It begins with an introduction to the fundamental principles, main process variants (thermal, ultraviolet, and electrochemical NIL), as well as key technical issues. Subsequently, through specific applications in organic light-emitting diodes, organic solar cells, and organic field-effect transistors, it highlights the exceptional capabilities of NIL to enhance device performance by controlling crystallization and creating functional micro/nanostructuring. Specific advantages include enabling high-efficiency light management to overcome efficiency bottlenecks, facilitating low-cost, high-throughput manufacturing for industrialization, full compatibility with flexible substrates for emerging applications, enabling multifunctional integration and novel device architectures, and tailoring material microstructures and properties advance fundamental research. Finally, we discuss the remaining challenges and future prospects of NIL in integrated organic optoelectronic systems.

High-density organic electrochemical transistor (OECT) arrays are essential for neuromorphic computing and bioelectronic interfaces, but progress has been limited by the low resolution of electrolyte patterning. Although conventional photolithography offers high feature resolution, it involves a fundamental trade-off among spatial resolution, ionic capacitance, and stability in the electrolyte. Here we report an ion compensation-assisted photolithography (ICAP) strategy that yields electrolyte micro-patterns combining high precision, high capacitance and high stability. A molecularly engineered electrolyte forms, under UV exposure, a physicochemical dual cross-linked network with strong solvent resistance and hydrophobicity, which suppresses swelling during both aqueous development and the subsequent ion-compensation step, preserving pattern fidelity. Ion compensation then restores and enhances the mobile-ion content, increasing areal capacitance. The resulting electrolytes achieve a record 2 μm resolution, 15.6 μF cm−2 capacitance, and strong thermal stability from − 50 to 200 °C. Integrated into OECTs, the ICAP-patterned electrolytes suppress crosstalk by 97.6% and boost on/off ratios by 325%, reducing parasitic coupling by more than 40 times compared to unpatterned arrays. The method is compatible with p-type and n-type organic semiconductors and inorganic oxides, providing a versatile route to scalable neuromorphic circuits and advanced bioelectronics.

Suspended membranes of monatomic graphene exhibit great potential for applications in electronic and nanoelectromechanical devices. In this work, a “hot and dry” transfer process is demonstrated to address the fabrication and patterning challenges of large-area graphene membranes on top of closed, sealed cavities. Here, “hot” refers to the use of high temperature during transfer, promoting the adhesion. Additionally, “dry” refers to the absence of liquids when graphene and target substrate are brought into contact. The method leads to higher yields of intact suspended monolayer chemical vapor deposition (CVD) graphene and artificially stacked double-layer CVD graphene membranes than previously reported. The yield evaluation is performed using neural-network-based object detection in scanning electron microscopy (SEM) images, ascertaining high yields of intact membranes with large statistical accuracy. The suspended membranes are examined by Raman tomography and atomic force microscopy (AFM). The method is verified by applying the suspended graphene devices as piezoresistive pressure sensors. Our technology advances the application of suspended graphene membranes and can be extended to other two-dimensional materials.

Micro/nanofabrication techniques have revolutionized modern photonics and electronics. However, conventional methods remain incompatible with living organisms due to inherent constraints including nonconformal coating, radiation damage, and toxic solvent requirements. Here, we present ice lithography for direct fabrication of micro/nanoscale patterns on the surfaces of tardigrades in their cryptobiotic state. Remarkably, upon rehydration the tardigrades revive, retaining the patterns on their surfaces. By precisely controlling parameters such as ice thickness, beam energy, and substrate properties, this method minimizes sample damage while achieving patterns as small as 72 nm. These patterns remain stable even after stretching, solvent immersion, rinsing, and drying. This approach provides new insights into tardigrades’ resilience and has potential applications in cryopreservation, biomedicine, and astrobiology. Furthermore, integrating micro/nanofabrication techniques with living organisms could catalyze advancements in biosensing, biomimetics, and living microrobotics.

" data-large-file="https://3druck.com/wp-content/uploads/2026/05/2026-ME-Chang-EUV-13-1024x768.jpg" /> Forschende der Cockrell School of Engineering an der University of Texas at Austin haben ein kompaktes EUV-Lithografiesystem mit einem Verfahren für volumetrisches 3D-Patterning kombiniert. Ziel ist es, Nanostrukturen schneller und günstiger herzustellen, als es mit herkömmlichen Prozessen in der Halbleiterfertigung möglich ist. Die Arbeiten wurden in Nano Letters veröffentlicht und sind Teil eines größeren Forschungsprogramms […] Der Beitrag UT-Forschende drucken 3D-Nanostrukturen mit kompaktem EUV-System erschien zuerst auf 3Druck.com - The Independent AM Magazine.

**Abstract:** This research presents a novel method for generating highly uniform and spatially controlled chloroauric acid (HAuCl₄) nanoparticle arrays for advanced sensor applications. Leveraging dynamic feedback-controlled electron beam lithography (DB-EBL) in conjunction with a precisely modulated HAuCl₄ reduction process, we achieve resolution exceeding 10 nm, a significant advancement over existing techniques. This work details the integrated system, control algorithms, and experimental validation, demonstrating the potential for high-throughput fabrication of nano-optics, plasmonic devices, and nanoscale sensing platforms.

**Abstract:** This paper introduces a novel approach to micro- and nano-scale patterning utilizing self-assembled monolayers (SAMs) with dynamically tunable surface energy gradients. Leveraging quantum tunneling microscopy (QTM) feedback loops to control localized chemical deposition, we achieve unprecedented precision and resolution in pattern formation, surpassing conventional lithographic techniques. The proposed methodology, termed Quantum-Controlled SAM Patterning (QCSP), leverages established SAM chemistry and QTM technology, demonstrating immediate commercial viability and significant advancements for microelectronics, bio-sensing, and microfluidics applications.