Researchers propose a hybrid method between traditional microfabrication assessment and interferometric metrology in order to characterize large-area gratings fabricated via electron beam lithography #JVSTB doi.org/10.1116/6.00...
December 9, 2024 at 8:24 PM
Researchers propose a hybrid method between traditional microfabrication assessment and interferometric metrology in order to characterize large-area gratings fabricated via electron beam lithography #JVSTB doi.org/10.1116/6.00...
This new #JVSTB collection on Smart Sensors & Devices for Healthcare highlights research integrating materials science, nanotechnology, & biomedical engineering to develop next-gen healthcare technologies. Submit by Oct. 15, 2025! ⚕️
tinyurl.com/3czpycey
tinyurl.com/3czpycey
Smart Sensors and Devices for Healthcare - AIP Publishing LLC
tinyurl.com
April 9, 2025 at 5:53 PM
This new #JVSTB collection on Smart Sensors & Devices for Healthcare highlights research integrating materials science, nanotechnology, & biomedical engineering to develop next-gen healthcare technologies. Submit by Oct. 15, 2025! ⚕️
tinyurl.com/3czpycey
tinyurl.com/3czpycey
Using Mueller Matrix Spectroscopic #Ellipsometry, a new #machinelearning based method is speeding up the measurement of high-aspect-ratio (HAR) structures in #microelectronics & #photonics - vital for devices like MEMS, #semiconductors, & #solarcells. #JVSTB
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Accurate fabrication of high-aspect ratio (HAR) structures in applications from semiconductor devices to x-ray observatories is essential for their optimal perf
doi.org
February 13, 2025 at 5:09 PM
Using Mueller Matrix Spectroscopic #Ellipsometry, a new #machinelearning based method is speeding up the measurement of high-aspect-ratio (HAR) structures in #microelectronics & #photonics - vital for devices like MEMS, #semiconductors, & #solarcells. #JVSTB
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Featured on the #JVSTB cover, researchers from OTH Regensburg & Ketek GmbH developed an on-chip field emission electron source that eliminates manual chip alignment while reducing discharge-related failures, advancing more robust silicon-based devices.
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
August 5, 2026 at 7:05 PM
Featured on the #JVSTB cover, researchers from OTH Regensburg & Ketek GmbH developed an on-chip field emission electron source that eliminates manual chip alignment while reducing discharge-related failures, advancing more robust silicon-based devices.
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Researchers in Japan are tackling the challenge of transmission loss in antenna substrates used for next-gen #6G communication systems by eliminating the need for metal adhesion layers like titanium, using novel surface treatments. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Analysis of the adhesion structure between the cycloolefin polymer and the copper seed layer formed using medium-vacuum sputtering
We have developed a novel approach for the fabrication of 6G communication antenna substrates by directly sputtering a copper seed layer onto a resin with low d
doi.org
February 24, 2025 at 8:47 PM
Researchers in Japan are tackling the challenge of transmission loss in antenna substrates used for next-gen #6G communication systems by eliminating the need for metal adhesion layers like titanium, using novel surface treatments. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
This work is being presented at #AVS71 - and you can still submit your abstract until August 18th! Authors presenting at AVS71 are invited to submit to #JVSTA or #JVSTB.
Submit your abstract today!
avs71.avs.org/abstract-sub...
Submit your abstract today!
avs71.avs.org/abstract-sub...
Abstract Submission
avs71.avs.org
June 5, 2025 at 2:33 PM
This work is being presented at #AVS71 - and you can still submit your abstract until August 18th! Authors presenting at AVS71 are invited to submit to #JVSTA or #JVSTB.
Submit your abstract today!
avs71.avs.org/abstract-sub...
Submit your abstract today!
avs71.avs.org/abstract-sub...
UC Riverside researchers focus a helium ion beam to less than one nanometer to convert material from superconductor to insulator for direct patterning of nanoscale energy-efficient quantum circuits. #JVSTB doi.org/10.1116/6.00...
Nanofabrication of high transition temperature superconductive electronics with focused helium ion irradiation
Superconductive electronics from Josephson junctions are governed by quantum mechanical tunneling through sub-10 nm scale insulating tunnel barriers. The electr
doi.org
January 29, 2025 at 5:40 AM
UC Riverside researchers focus a helium ion beam to less than one nanometer to convert material from superconductor to insulator for direct patterning of nanoscale energy-efficient quantum circuits. #JVSTB doi.org/10.1116/6.00...
In this #JVSTB study, an endoscope-assisted manipulator for low-temperature STM systems is designed for precise sample handling, precooling, & deposition. It enhances alignment, reduces thermal shock, & prevents contamination. #microscopy @avs-members.bsky.social doi.org/10.1116/6.00...
Endoscope-assisted manipulator for precooling and deposition in low-temperature scanning tunneling microscope systems
We present the design and implementation of an advanced manipulator system for use in low-temperature scanning tunneling microscope (STM) setups, specifically i
doi.org
February 12, 2025 at 3:59 PM
In this #JVSTB study, an endoscope-assisted manipulator for low-temperature STM systems is designed for precise sample handling, precooling, & deposition. It enhances alignment, reduces thermal shock, & prevents contamination. #microscopy @avs-members.bsky.social doi.org/10.1116/6.00...
Today we congratulate Stefan Zollner, #JVSTB Most Valuable Reviewer for 2024! Stefan has been a consistent & reliable reviewer for many years & has published with us often. You can read some of his work at the link below.
Thank you, Stefan!
#peerreview
tinyurl.com/5f5d7nj8
Thank you, Stefan!
#peerreview
tinyurl.com/5f5d7nj8
March 6, 2025 at 7:46 PM
Today we congratulate Stefan Zollner, #JVSTB Most Valuable Reviewer for 2024! Stefan has been a consistent & reliable reviewer for many years & has published with us often. You can read some of his work at the link below.
Thank you, Stefan!
#peerreview
tinyurl.com/5f5d7nj8
Thank you, Stefan!
#peerreview
tinyurl.com/5f5d7nj8
This article from our collection of papers from the 67th #EIPBN 2024 was featured on the latest cover of #JVSTB!
Read the paper here: doi.org/10.1116/6.00...
Check out the entire collection below and stay tuned for papers from this year's meeting!
tinyurl.com/mr3saj4e
Read the paper here: doi.org/10.1116/6.00...
Check out the entire collection below and stay tuned for papers from this year's meeting!
tinyurl.com/mr3saj4e
April 11, 2025 at 3:09 PM
This article from our collection of papers from the 67th #EIPBN 2024 was featured on the latest cover of #JVSTB!
Read the paper here: doi.org/10.1116/6.00...
Check out the entire collection below and stay tuned for papers from this year's meeting!
tinyurl.com/mr3saj4e
Read the paper here: doi.org/10.1116/6.00...
Check out the entire collection below and stay tuned for papers from this year's meeting!
tinyurl.com/mr3saj4e
#JVSTB Editor Pick: Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores doi.org/10.1116/6.00...
Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores
In this manuscript, we report the facile fabrication of large-area model membranes with highly uniform and high aspect ratio pores with diameters <20 nm. The
doi.org
January 22, 2025 at 8:32 PM
#JVSTB Editor Pick: Fabrication of model ultrafiltration membranes with uniform, high aspect ratio pores doi.org/10.1116/6.00...
As #semiconductor technology advances, high-performance photoresists are needed for precise chip manufacturing. This multi-PAG model accurately simulates these complex reactions in modern resists, improving lithography precision and optimization. #JVSTB
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Extended model for chemically amplified resist with multiple photoacid generators
The chemically amplified resist, which contains photoacid generator (PAG), has been widely used in high-volume integrated circuit manufacturing. Conventional re
doi.org
March 26, 2025 at 2:11 PM
As #semiconductor technology advances, high-performance photoresists are needed for precise chip manufacturing. This multi-PAG model accurately simulates these complex reactions in modern resists, improving lithography precision and optimization. #JVSTB
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Researchers from @usc.edu developed a 3D nanoimprint lithography technique to create multilayer metasurfaces, boosting the performance of next-gen optical metasurface devices for fields like #LiDAR, #QuantumSensing, & particle control #JVSTB #EIPBN doi.org/10.1116/6.00...
Optical metasurface fabricated using 3D nanoimprint lithography
To improve the performance of the next-generation optical metasurface device, we investigated the feasibility of practical design and fabrication processes for
doi.org
February 11, 2025 at 4:17 PM
Researchers from @usc.edu developed a 3D nanoimprint lithography technique to create multilayer metasurfaces, boosting the performance of next-gen optical metasurface devices for fields like #LiDAR, #QuantumSensing, & particle control #JVSTB #EIPBN doi.org/10.1116/6.00...
#JVSTB Featured Article: Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nano-patterning doi.org/10.1116/6.00...
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Three-dimensional (3D) stacking of nano-devices is an effective method for increasing areal density, especially as downscaling of lateral device dimensions beco
doi.org
January 22, 2025 at 8:35 PM
#JVSTB Featured Article: Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nano-patterning doi.org/10.1116/6.00...
Microfabricated nanocalorimeters prove to be effective for monitoring plasma-generated radicals, widely used in #semiconductor fabrication. Researchers from NIST and @univofmaryland.bsky.social report rapid response times and high sensitivity. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Nanocalorimetry for plasma metrology relevant to semiconductor fabrication
This letter reports on pilot tests of microfabricated nanocalorimeters as a metrology platform for rapid (<40 ms response time) and sensitive (in the range o
doi.org
February 27, 2025 at 4:57 PM
Microfabricated nanocalorimeters prove to be effective for monitoring plasma-generated radicals, widely used in #semiconductor fabrication. Researchers from NIST and @univofmaryland.bsky.social report rapid response times and high sensitivity. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
In this #JVSTB Editor's Pick, researchers from @univofmaryland.bsky.social, #NIST, and #UMBC fabricated silicon W- and G- center embedded LEDs to address the need for reliable quantum light sources. doi.org/10.1116/6.00...
Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence
The need for reliable quantum light sources drives our research to study color centers (CCs) in silicon as telecommunication O-band emitters. Building from phot
doi.org
February 6, 2025 at 12:55 AM
In this #JVSTB Editor's Pick, researchers from @univofmaryland.bsky.social, #NIST, and #UMBC fabricated silicon W- and G- center embedded LEDs to address the need for reliable quantum light sources. doi.org/10.1116/6.00...
Characterizing electromagnetic field strength surrounding a nanometer terminated ESR line using a coupled receiving antenna, fabricated for atomic scale single dopant qubit manipulation. #JVSTB doi.org/10.1116/6.00...
Design, modeling, and fabrication of high frequency Oersted lines for electron spin manipulation in silicon based quantum devices
Coherent manipulation of electron spins is one of the central challenges of silicon-based quantum computing efforts. Electron spin resonance (ESR) lines, or Oer
doi.org
January 14, 2025 at 9:13 PM
Characterizing electromagnetic field strength surrounding a nanometer terminated ESR line using a coupled receiving antenna, fabricated for atomic scale single dopant qubit manipulation. #JVSTB doi.org/10.1116/6.00...
A long-time contributor to #JVSTA & #JVSTB, this collection celebrates the important contributions of John Ekerdt to the area of surface & reaction chemistry of electronic & optoelectronic materials. Read the entire collection FREE for a limited time!
tinyurl.com/mpe77skk
tinyurl.com/mpe77skk
Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials
Email from AVS Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials Read the Full Collection for FREE for a Lim
tinyurl.com
April 16, 2025 at 3:38 PM
A long-time contributor to #JVSTA & #JVSTB, this collection celebrates the important contributions of John Ekerdt to the area of surface & reaction chemistry of electronic & optoelectronic materials. Read the entire collection FREE for a limited time!
tinyurl.com/mpe77skk
tinyurl.com/mpe77skk
Researchers in Japan have developed a cycle etching method for GaN to fabricate #metaloxide #semiconductor HEMTs. By alternating exposure to BCl3 gas and F2-added Ar #plasma, they achieved precise etching control with minimal damage. #JVSTB @avs-members.bsky.social
doi.org/10.1116/5.02...
doi.org/10.1116/5.02...
Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400 °C
Cycle etching of GaN with high etching rate controllability was achieved by cycle exposure to BCl3 gas and F2-added Ar plasma at an ion energy of 23 eV and a su
doi.org
February 26, 2025 at 2:50 PM
Researchers in Japan have developed a cycle etching method for GaN to fabricate #metaloxide #semiconductor HEMTs. By alternating exposure to BCl3 gas and F2-added Ar #plasma, they achieved precise etching control with minimal damage. #JVSTB @avs-members.bsky.social
doi.org/10.1116/5.02...
doi.org/10.1116/5.02...
In this #JVSTB cover feature, researchers explore the optimization of suspended stencil mask lithography for the fabrication of multiterminal Josephson junctions.
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
July 28, 2026 at 4:21 PM
In this #JVSTB cover feature, researchers explore the optimization of suspended stencil mask lithography for the fabrication of multiterminal Josephson junctions.
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Don't know the difference between #JVSTA & #JVSTB? Don't worry, you're not alone!
Check out the full scope of each journal on our websites.
JVST A ➡️ pubs.aip.org/avs/jva/page...
JVST B ➡️ pubs.aip.org/avs/jvb/page...
We can't wait to see what you submit (and to which journal)!
Check out the full scope of each journal on our websites.
JVST A ➡️ pubs.aip.org/avs/jva/page...
JVST B ➡️ pubs.aip.org/avs/jvb/page...
We can't wait to see what you submit (and to which journal)!
May 21, 2026 at 3:01 PM
Don't know the difference between #JVSTA & #JVSTB? Don't worry, you're not alone!
Check out the full scope of each journal on our websites.
JVST A ➡️ pubs.aip.org/avs/jva/page...
JVST B ➡️ pubs.aip.org/avs/jvb/page...
We can't wait to see what you submit (and to which journal)!
Check out the full scope of each journal on our websites.
JVST A ➡️ pubs.aip.org/avs/jva/page...
JVST B ➡️ pubs.aip.org/avs/jvb/page...
We can't wait to see what you submit (and to which journal)!
In #JVSTB, researchers present a tabletop EUV test platform designed for lab-scale evaluation of lithography materials to reduce reliance on large, costly facilities while still enabling reliable measurements
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Tabletop extreme ultraviolet test platform for optical property evaluation of lithography materials
Extreme ultraviolet (EUV) lithography, owing to its ultrashort wavelength and high photon energy, serves as a key technology in advanced semiconductor manufactu
doi.org
February 10, 2026 at 4:18 PM
In #JVSTB, researchers present a tabletop EUV test platform designed for lab-scale evaluation of lithography materials to reduce reliance on large, costly facilities while still enabling reliable measurements
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Featured on our most recent #JVSTB cover, researchers from AIST in Japan highlight the critical importance of interparticle contact in optimizing all-solid-state battery performance, offering valuable insights for improving battery design.🔋
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
November 12, 2025 at 6:33 PM
Featured on our most recent #JVSTB cover, researchers from AIST in Japan highlight the critical importance of interparticle contact in optimizing all-solid-state battery performance, offering valuable insights for improving battery design.🔋
doi.org/10.1116/6.00...
doi.org/10.1116/6.00...
Featured on the latest #JVSTB cover, authors from @czechacademy.bsky.social & Brno University of Technology developed a custom-designed compact vacuum chamber for laser induced plasma etching. doi.org/10.1116/6.00...
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
Reactive ion etching and reactive ion beam etching are widely used processes in the semiconductor industry but face challenges due to their high cost, energy de
doi.org
June 9, 2025 at 1:59 PM
Featured on the latest #JVSTB cover, authors from @czechacademy.bsky.social & Brno University of Technology developed a custom-designed compact vacuum chamber for laser induced plasma etching. doi.org/10.1116/6.00...
Covering nanoscience & technology of vacuum electron sources & their applications, #JVSTB publishes a collection on Vacuum Nanoelectronics each year. Read the recent collection FREE for a limited time & submit to this year's now!
📑 Read: tinyurl.com/2vm6xnec
✏️ Submit: tinyurl.com/yntp2p5h
📑 Read: tinyurl.com/2vm6xnec
✏️ Submit: tinyurl.com/yntp2p5h
LinkedIn
This link will take you to a page that’s not on LinkedIn
lnkd.in
May 27, 2025 at 5:53 PM
Covering nanoscience & technology of vacuum electron sources & their applications, #JVSTB publishes a collection on Vacuum Nanoelectronics each year. Read the recent collection FREE for a limited time & submit to this year's now!
📑 Read: tinyurl.com/2vm6xnec
✏️ Submit: tinyurl.com/yntp2p5h
📑 Read: tinyurl.com/2vm6xnec
✏️ Submit: tinyurl.com/yntp2p5h