#JVSTB
Featured on the #JVSTB cover, researchers from OTH Regensburg & Ketek GmbH developed an on-chip field emission electron source that eliminates manual chip alignment while reducing discharge-related failures, advancing more robust silicon-based devices.

doi.org/10.1116/6.00...
August 5, 2026 at 7:05 PM
In this #JVSTB cover feature, researchers explore the optimization of suspended stencil mask lithography for the fabrication of multiterminal Josephson junctions.

doi.org/10.1116/6.00...
July 28, 2026 at 4:21 PM
Sign up for FREE AVS webinar on Writing an Effective Abstract ➡️June 16 from 2:00 p.m.-3:00 p.m. (ET). Presented by Sally McArthur and hosted by #AVSPublications avs.swoogo.com/avswebinars2... #JVSTA #JVSTB #SurfaceScieneSpectra #Biointerphases #AVSQuantumScience #AVS72
May 27, 2026 at 1:28 PM
Don't know the difference between #JVSTA & #JVSTB? Don't worry, you're not alone!

Check out the full scope of each journal on our websites.

JVST A ➡️ pubs.aip.org/avs/jva/page...
JVST B ➡️ pubs.aip.org/avs/jvb/page...

We can't wait to see what you submit (and to which journal)!
May 21, 2026 at 3:01 PM
In #JVSTB, researchers present a tabletop EUV test platform designed for lab-scale evaluation of lithography materials to reduce reliance on large, costly facilities while still enabling reliable measurements

doi.org/10.1116/6.00...
Tabletop extreme ultraviolet test platform for optical property evaluation of lithography materials
Extreme ultraviolet (EUV) lithography, owing to its ultrashort wavelength and high photon energy, serves as a key technology in advanced semiconductor manufactu
doi.org
February 10, 2026 at 4:18 PM
Featured on our most recent #JVSTB cover, researchers from AIST in Japan highlight the critical importance of interparticle contact in optimizing all-solid-state battery performance, offering valuable insights for improving battery design.🔋
doi.org/10.1116/6.00...
November 12, 2025 at 6:33 PM
Check out these open special issues from @jvstab.bsky.social‬ ‪@avs-members.bsky.social! Stop by #AVS71 Booth 500 to learn more or visit us online!

JVSTA: https://aippub.org/48lyWVK
JVSTB: https://aippub.org/4gt2fHQ
September 24, 2025 at 5:00 PM
Featured on the latest #JVSTB cover, authors from @czechacademy.bsky.social & Brno University of Technology developed a custom-designed compact vacuum chamber for laser induced plasma etching. doi.org/10.1116/6.00...
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
Reactive ion etching and reactive ion beam etching are widely used processes in the semiconductor industry but face challenges due to their high cost, energy de
doi.org
June 9, 2025 at 1:59 PM
This work is being presented at #AVS71 - and you can still submit your abstract until August 18th! Authors presenting at AVS71 are invited to submit to #JVSTA or #JVSTB.

Submit your abstract today!
avs71.avs.org/abstract-sub...
Abstract Submission
avs71.avs.org
June 5, 2025 at 2:33 PM
Covering nanoscience & technology of vacuum electron sources & their applications, #JVSTB publishes a collection on Vacuum Nanoelectronics each year. Read the recent collection FREE for a limited time & submit to this year's now!

📑 Read: tinyurl.com/2vm6xnec

✏️ Submit: tinyurl.com/yntp2p5h
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May 27, 2025 at 5:53 PM
#JVSTB has published collections on Vacuum Nanoelectronics for many years - contribute to our new collection now! Covering topics on the science, technology, & applications of vacuum electron sources.

Submit until October 15, 2025!

tinyurl.com/yntp2p5h
Vacuum Nanoelectronics - AIP Publishing LLC
tinyurl.com
May 20, 2025 at 6:01 PM
Our new #JVSTB collection covers the latest advances in sensor technologies & medical devices that leverage vacuum, nanotechnology, & advanced fabrication techniques - submit to the collection on Smart Sensors & Devices for Healthcare by October 15, 2025!
tinyurl.com/3czpycey
Smart Sensors and Devices for Healthcare - AIP Publishing LLC
tinyurl.com
May 14, 2025 at 1:01 PM
AVS has lots to offer the #semiconductor industry, including high-impact research related to the #CHIPSAct. Check our our recent collection in #JVSTB on related research - FREE for a limited time! @avs-members.bsky.social

tinyurl.com/4kwnebmy
Read Recent Collection on CHIPS: Future of Semiconductor Processing and Devices
Email from AVS Read Recent Collection on CHIPS: Future of Semiconductor Processing and Devices Read the Collection for FREE for a Limited Time! Future of plasma etching for microelectronics: Challenge
tinyurl.com
May 2, 2025 at 4:04 PM
A long-time contributor to #JVSTA & #JVSTB, this collection celebrates the important contributions of John Ekerdt to the area of surface & reaction chemistry of electronic & optoelectronic materials. Read the entire collection FREE for a limited time!
tinyurl.com/mpe77skk
Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials
Email from AVS   Read Recent Collection Honoring John Ekerdt’s Contributions to Chemical Reaction Engineering and Surface Chemistry for Electronic Materials Read the Full Collection for FREE for a Lim
tinyurl.com
April 16, 2025 at 3:38 PM
This article from our collection of papers from the 67th #EIPBN 2024 was featured on the latest cover of #JVSTB!

Read the paper here: doi.org/10.1116/6.00...

Check out the entire collection below and stay tuned for papers from this year's meeting!

tinyurl.com/mr3saj4e
April 11, 2025 at 3:09 PM
This new #JVSTB collection on Smart Sensors & Devices for Healthcare highlights research integrating materials science, nanotechnology, & biomedical engineering to develop next-gen healthcare technologies. Submit by Oct. 15, 2025! ⚕️

tinyurl.com/3czpycey
Smart Sensors and Devices for Healthcare - AIP Publishing LLC
tinyurl.com
April 9, 2025 at 5:53 PM
As #semiconductor technology advances, high-performance photoresists are needed for precise chip manufacturing. This multi-PAG model accurately simulates these complex reactions in modern resists, improving lithography precision and optimization. #JVSTB

doi.org/10.1116/6.00...
Extended model for chemically amplified resist with multiple photoacid generators
The chemically amplified resist, which contains photoacid generator (PAG), has been widely used in high-volume integrated circuit manufacturing. Conventional re
doi.org
March 26, 2025 at 2:11 PM
Today we congratulate Stefan Zollner, #JVSTB Most Valuable Reviewer for 2024! Stefan has been a consistent & reliable reviewer for many years & has published with us often. You can read some of his work at the link below.

Thank you, Stefan!

#peerreview
tinyurl.com/5f5d7nj8
March 6, 2025 at 7:46 PM
Microfabricated nanocalorimeters prove to be effective for monitoring plasma-generated radicals, widely used in #semiconductor fabrication. Researchers from NIST and @univofmaryland.bsky.social report rapid response times and high sensitivity. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
Nanocalorimetry for plasma metrology relevant to semiconductor fabrication
This letter reports on pilot tests of microfabricated nanocalorimeters as a metrology platform for rapid (<40 ms response time) and sensitive (in the range o
doi.org
February 27, 2025 at 4:57 PM
Researchers in Japan have developed a cycle etching method for GaN to fabricate #metaloxide #semiconductor HEMTs. By alternating exposure to BCl3 gas and F2-added Ar #plasma, they achieved precise etching control with minimal damage. #JVSTB @avs-members.bsky.social
doi.org/10.1116/5.02...
Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400 °C
Cycle etching of GaN with high etching rate controllability was achieved by cycle exposure to BCl3 gas and F2-added Ar plasma at an ion energy of 23 eV and a su
doi.org
February 26, 2025 at 2:50 PM
Researchers in Japan are tackling the challenge of transmission loss in antenna substrates used for next-gen #6G communication systems by eliminating the need for metal adhesion layers like titanium, using novel surface treatments. #JVSTB @avs-members.bsky.social
doi.org/10.1116/6.00...
Analysis of the adhesion structure between the cycloolefin polymer and the copper seed layer formed using medium-vacuum sputtering
We have developed a novel approach for the fabrication of 6G communication antenna substrates by directly sputtering a copper seed layer onto a resin with low d
doi.org
February 24, 2025 at 8:47 PM
Using Mueller Matrix Spectroscopic #Ellipsometry, a new #machinelearning based method is speeding up the measurement of high-aspect-ratio (HAR) structures in #microelectronics & #photonics - vital for devices like MEMS, #semiconductors, & #solarcells. #JVSTB
doi.org/10.1116/6.00...
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Accurate fabrication of high-aspect ratio (HAR) structures in applications from semiconductor devices to x-ray observatories is essential for their optimal perf
doi.org
February 13, 2025 at 5:09 PM
In this #JVSTB study, an endoscope-assisted manipulator for low-temperature STM systems is designed for precise sample handling, precooling, & deposition. It enhances alignment, reduces thermal shock, & prevents contamination. #microscopy @avs-members.bsky.social doi.org/10.1116/6.00...
Endoscope-assisted manipulator for precooling and deposition in low-temperature scanning tunneling microscope systems
We present the design and implementation of an advanced manipulator system for use in low-temperature scanning tunneling microscope (STM) setups, specifically i
doi.org
February 12, 2025 at 3:59 PM
Researchers from @usc.edu developed a 3D nanoimprint lithography technique to create multilayer metasurfaces, boosting the performance of next-gen optical metasurface devices for fields like #LiDAR, #QuantumSensing, & particle control #JVSTB #EIPBN doi.org/10.1116/6.00...
Optical metasurface fabricated using 3D nanoimprint lithography
To improve the performance of the next-generation optical metasurface device, we investigated the feasibility of practical design and fabrication processes for
doi.org
February 11, 2025 at 4:17 PM
Researchers from OTH Regensburg and Ketek GmbH have developed a method for measuring current distributions across field emission arrays using a Cu-coated #CMOS image sensor, allowing for high-res mapping of emission currents without damaging the sensor surface. doi.org/10.1116/6.00... #JVSTB
Measurement of field emission array current distributions by metal-coated CMOS image sensors
A CMOS image sensor is utilized to determine the time- and spatially resolved distribution of the total electron emission current of a silicon field emission ar
doi.org
February 10, 2025 at 3:17 PM